High-repetition rate pulsed laser deposition of ZrC thin films

Surface and Coatings Technology

Volumn 203, Issue 8, 2009, Pages 1055-1058

  Craciun, D ^a   Socol, G ^a   Stefan, N ^a   Mihailescu, I N ^a   Bourne, G ^b   Craciun, V ^a,b  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b University of Florida   (United States)

Author keywords

Hard coatings; Pulsed laser deposition; Thin films; ZrC

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CARBIDES; DEPOSITION RATES; EXCIMER LASERS; HARD COATINGS; PULSED LASER DEPOSITION; PULSED LASERS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TEXTURES; X RAY DIFFRACTION; ZIRCONIUM COMPOUNDS;

AS-DEPOSITED FILMS; AUGER ELECTRON SPECTROSCOPIES (AES); HIGH REPETITION RATE; OXYGEN CONCENTRATIONS; SUBSTRATE TEMPERATURE; SURFACE ELEMENTAL COMPOSITIONS; X RAY REFLECTIVITY; X-RAY DIFFRACTION INVESTIGATIONS;

THIN FILMS;

EID: 57549118902     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.09.039     Document Type: Article

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