Study of the stoichiometry transfer in pulsed laser deposition of bioactive silica-based glasses

Thin Solid Films

Volumn 453-454, Issue , 2004, Pages 219-223

  Liste, S ^a   Gonzalez P ^a   Serra, J ^a   Borrajo, J P ^a   Chiussi, S ^a   Leon B ^a   Perez Amor M ^a   López, J García ^b   Ferrer, F J ^b   Morilla, Y ^b   Respaldiza, M A ^b  

^a UNIVERSITY OF VIGO   (Spain)

^b CENTRO NACIONAL DE ACELERADORES   (Spain)

Author keywords

Biomaterials; Coatings; Glass; Laser ablation

Indexed keywords

BIOMATERIALS; BONDING; COATINGS; CONTAMINATION; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LASER ABLATION; PULSED LASER DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; STOICHIOMETRY; THIN FILMS; VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

NUCLEAR REACTION ANALYSIS (NRA); PARTICLE INDUCED X-RAY EMISSION (PIXE);

GLASS;

EID: 12144291625     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.11.123     Document Type: Conference Paper

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