Reactive magnetron sputter deposition of polycrystalline vanadium nitride films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 6, 1996, Pages 3124-3129

  Chu, X ^a   Barnett, S A ^a   Wong, M S ^b   Sproul, W D ^b  

^a Northwestern University   (United States)

^b NORTHWESTERN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030511418     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580180     Document Type: Article

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