Growth and properties of Cu thin film deposited on Si(0 0 1) substrate: A molecular dynamics simulation study

Applied Surface Science

Volumn 261, Issue , 2012, Pages 690-696

  Zhang, Jun ^a   Liu, Chong ^a   Shu, Yonghua ^a   Fan, Jing ^a  

^a INSTITUTE OF MECHANICS   (China)

Author keywords

Crystalline structure and orientation; Molecular dynamics method; Surface roughness; Thin film deposition and growth

Indexed keywords

CRYSTAL ATOMIC STRUCTURE; CRYSTALLINE MATERIALS; ELECTRODEPOSITION; FILM GROWTH; FREE ENERGY; INTERFACES (MATERIALS); METALLIC FILMS; MIXING; MOLECULAR DYNAMICS; MOLECULAR ORIENTATION; SURFACE ROUGHNESS;

CRYSTALLINE ORIENTATIONS; CRYSTALLINE STRUCTURE; CRYSTALLINE STRUCTURE AND ORIENTATIONS; FACE CENTERED CUBIC STRUCTURE; MOLECULAR DYNAMICS METHODS; MOLECULAR DYNAMICS SIMULATIONS; THIN FILM DEPOSITION AND GROWTHS; THREE-DIMENSIONAL ISLAND GROWTH;

THIN FILMS;

EID: 84867741849     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.08.082     Document Type: Article

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