Atomistic study of deposition process of Al thin film on Cu substrate

Applied Surface Science

Volumn 256, Issue 20, 2010, Pages 5993-5997

  Cao, Yongzhi ^a   Zhang, Junjie ^a   Sun, Tao ^a   Yan, Yongda ^a   Yu, Fuli ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Deposition; Indentation; Molecular dynamics; Thin film

Indexed keywords

DEPOSITION; FILM GROWTH; INDENTATION; INTERFACES (MATERIALS); LATTICE MISMATCH; MOLECULAR DYNAMICS; NANOSTRUCTURED MATERIALS; SINGLE CRYSTALS;

AL THIN FILMS; ATOMISTIC SIMULATIONS; ATOMISTIC STUDIES; DEPOSITION PROCESS; FILM STRUCTURE; INCIDENT ENERGY; LAYER BY LAYER; SINGLE-CRYSTAL AL;

THIN FILMS;

EID: 77953132158     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.03.107     Document Type: Article

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