Structural and morphological characterisation of hybrid Cu/Si(0 0 1) structures

Surface Science

Volumn 601, Issue 5, 2007, Pages 1377-1383

  Vaz, C A F ^a   Steinmuller, S J ^a   Moutafis, C ^a   Bland, J A C ^a   Babkevich, A Yu ^b  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

Cu Si interface; Fcc Co; Surface roughness; X ray scattering

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COPPER; MAGNETIC THIN FILMS; MORPHOLOGY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SCANNING ELECTRON MICROSCOPY; SILICON; SURFACE ROUGHNESS; X RAY SCATTERING;

DIFFRACTION PATTERNS; SCANNING PROBE IMAGING TECHNIQUES; ULTRATHIN MAGNETIC FILMS;

CRYSTALLINE MATERIALS;

EID: 33847060895     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2007.01.001     Document Type: Article

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