Growth front roughening of room-temperature deposited copper nanocluster films

Applied Physics Letters

Volumn 81, Issue 6, 2002, Pages 1089-1091

  Palasantzas, G ^a   Koch, S A ^a   De Hosson, J Th M ^a  

^a UNIVERSITY OF GRONINGEN   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER NANOCLUSTERS; CORRELATION FUNCTION; DEPOSITION TIME; GROWTH FRONT; HEIGHT DISTRIBUTION; LOCAL SURFACES; LOW ENERGIES; POROUS FILM; POWER-LAW; ROOM TEMPERATURE; ROUGHNESS AMPLITUDE; ROUGHNESS EXPONENT; SCALING EXPONENT; SILICON SUBSTRATES;

ATOMIC FORCE MICROSCOPY; NANOCLUSTERS;

COPPER;

EID: 79956030302     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1497200     Document Type: Article

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