Characterization of magnetron-sputtered partially ionized aluminum deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 2, 1998, Pages 624-627

  Hayden, D B ^a   Juliano, D R ^a   Green, K M ^a   Ruzic, D N ^a   Weiss, C A ^b   Ashtiani, K A ^b   Licata, T J ^b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b Materials Research Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032376601     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581078     Document Type: Article

References (17)

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