Influence of chemical composition and deposition conditions on microstructure evolution during annealing of arc evaporated ZrAlN thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 3, 2012, Pages

  Rogstrom L ^a   Johansson, M P ^a,b   Ghafoor, N ^a   Hultman, L ^a   Oden M ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b SECO TOOLS AB   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

AL-CONTENT; ALN; ALUMINUM CONTENTS; ANNEALING TEMPERATURES; CHEMICAL COMPOSITIONS; DEPOSITION CONDITIONS; GRAIN SIZE; HEXAGONAL LATTICE; HEXAGONAL STRUCTURES; LOW BIAS; MICROSTRUCTURE EVOLUTIONS; NUCLEATION AND GROWTH; OUT-DIFFUSION; STRUCTURED FILMS; SUBSTRATE BIAS; TWO-PHASE STRUCTURES;

ALUMINUM NITRIDE; ANNEALING; DEPOSITION; HARDNESS; MICROSTRUCTURE; ZIRCONIUM;

ALUMINUM;

EID: 84864204203     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3698592     Document Type: Article

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