Hardness and residual stress in nanocrystalline ZrN films: Effect of bias voltage and heat treatment

Materials Science and Engineering: A

Volumn 500, Issue 1-2, 2009, Pages 104-108

  Tung, Hsiao Ming ^a   Huang, Jia Hong ^a   Tsai, Ding Guey ^b   Ai, Chi Fong ^b   Yu, Ge Ping ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b INSTITUTE OF NUCLEAR ENERGY RESEARCH   (Taiwan)

Author keywords

Bias; Hardness; Heat treatment; Residual stress; Texture; Zirconium nitride

Indexed keywords

BIAS VOLTAGE; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; HARDNESS; HEAT TREATMENT; ION IMPLANTATION; MICROSTRUCTURE; NANOCRYSTALS; NITRIDES; RESIDUAL STRESSES; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION; ZIRCONIUM COMPOUNDS;

AISI-304 STAINLESS STEEL; BIAS; CRISTALLINITY; FILM EFFECTS; GRAINSIZE; NANOCRYSTALLINE ZIRCONIA; NITRIDE FILMS; STAINLESS STEEL SUBSTRATES; TEXTURE COEFFICIENT; THIN-FILMS;

POINT DEFECTS;

EID: 56949107592     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msea.2008.09.006     Document Type: Article

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