Thin films of hard cubic Zr3N4 stabilized by stress

Nature Materials

Volumn 4, Issue 4, 2005, Pages 317-322

  Chhowalla, Manish ^a   Unalan, H Emrah ^a  

^a RUTGERS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CORROSION RESISTANCE; CRYSTAL STRUCTURE; FERMI LEVEL; IONIZATION; OXIDATION RESISTANCE; PHASE TRANSITIONS; PHYSICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; WEAR RESISTANCE; X RAY DIFFRACTION ANALYSIS; ZIRCONIUM COMPOUNDS;

CUBIC ZIRCONIUM NITRIDE; FILTERED CATHODIC ARC (FCA) METHOD; LOCALIZED HIGH-PRESSURE ARC DISCHARGE (LHPAD); PLASMA BEAMS;

THIN FILMS;

ION; NITROGEN; OXYGEN; TITANIUM; ZIRCONIUM;

ARTICLE; CHEMICAL STRUCTURE; CHEMISTRY; ELECTRODE; ELECTRON; MASS SPECTROMETRY; MATERIALS; MECHANICAL STRESS; RAMAN SPECTROMETRY; SPECTROPHOTOMETRY; THERMODYNAMICS; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION; X RAY CRYSTALLOGRAPHY; X RAY DIFFRACTION;

CRYSTALLOGRAPHY, X-RAY; ELECTRODES; ELECTRONS; IONS; MANUFACTURED MATERIALS; MASS SPECTROMETRY; MICROSCOPY, ELECTRON, TRANSMISSION; MODELS, MOLECULAR; NITROGEN; OXYGEN; SPECTROPHOTOMETRY; SPECTRUM ANALYSIS, RAMAN; STRESS, MECHANICAL; THERMODYNAMICS; TITANIUM; ULTRAVIOLET RAYS; X-RAY DIFFRACTION; ZIRCONIUM;

EID: 16244371360     PISSN: 14761122     EISSN: None     Source Type: Journal    
DOI: 10.1038/nmat1338     Document Type: Article

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