Growth and physical properties of epitaxial metastable Hf1 - xAlxN alloys deposited on MgO(001) by ultrahigh vacuum reactive magnetron sputtering

Surface and Coatings Technology

Volumn 202, Issue 4-7, 2007, Pages 809-814

  Howe, B ^b,c   Bareno J ^a   Sardela, M ^a   Wen, J G ^a   Greene, J E ^a   Hultman, L ^b   Voevodin, A A ^c   Petrov, I ^a  

^a United States of America   (United States)

^b LINKÖPING UNIVERSITY   (Sweden)

^c AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

Hard coatings; HfN; Magnetron sputtering; TEM; XRD

Indexed keywords

EPITAXIAL GROWTH; HAFNIUM ALLOYS; HARDNESS; LATTICE CONSTANTS; MAGNETRON SPUTTERING; METASTABLE PHASES; REACTIVE SPUTTERING; SUBSTRATES; ULTRAHIGH VACUUM;

EPITAXIAL METASTABLE; ULTRAHIGH VACUUM REACTIVE MAGNETRON SPUTTERING; VEGARD'S RULE;

HARD COATINGS;

EPITAXIAL GROWTH; HAFNIUM ALLOYS; HARD COATINGS; HARDNESS; LATTICE CONSTANTS; MAGNETRON SPUTTERING; METASTABLE PHASES; REACTIVE SPUTTERING; SUBSTRATES; ULTRAHIGH VACUUM;

EID: 36048971094     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.05.079     Document Type: Article

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