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Volumn 50, Issue 20, 2002, Pages 5103-5114
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The influence of thermal annealing on residual stresses and mechanical properties of arc-evaporated TiCxN1-x (x = 0, 0.15 and 0.45) thin films
a
SECO TOOLS AB
(Sweden)
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Author keywords
Activation energies; Annealing; Arc evaporation; Hardness; PVD coating; Residual stresses; Thermal stability; Titanium carbonitride
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Indexed keywords
ACTIVATION ENERGY;
ANNEALING;
METALLOGRAPHIC MICROSTRUCTURE;
RESIDUAL STRESSES;
THIN FILMS;
TITANIUM COMPOUNDS;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY DIFFRACTION ANALYSIS;
ARC EVAPORATION;
METALLIC FILMS;
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EID: 0037015980
PISSN: 13596454
EISSN: None
Source Type: Journal
DOI: 10.1016/S1359-6454(02)00365-8 Document Type: Article |
Times cited : (69)
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References (32)
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