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Volumn 50, Issue 20, 2002, Pages 5103-5114

The influence of thermal annealing on residual stresses and mechanical properties of arc-evaporated TiCxN1-x (x = 0, 0.15 and 0.45) thin films

Author keywords

Activation energies; Annealing; Arc evaporation; Hardness; PVD coating; Residual stresses; Thermal stability; Titanium carbonitride

Indexed keywords

ACTIVATION ENERGY; ANNEALING; METALLOGRAPHIC MICROSTRUCTURE; RESIDUAL STRESSES; THIN FILMS; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

EID: 0037015980     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6454(02)00365-8     Document Type: Article
Times cited : (69)

References (32)
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    • (1993) Proceedings of the 13th International Plansee Seminar
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  • 16
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    • Transition metal carbides and nitrides
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    • Toth L.E. Transition metal carbides and nitrides. Refractory materials. vol. 7:1971;Academic Press, New York and London.
    • (1971) Refractory materials , vol.7
    • Toth, L.E.1
  • 25
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    • Komarek K.L. Vienna: Int. Atomic Energy Agency
    • Komarek K.L. Atomic energy review, special issue 9. 1993;Int. Atomic Energy Agency, Vienna.
    • (1993) Atomic energy review, special issue , vol.9
  • 27
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    • cited in Ref. [47]
    • Repkin V.D. Chem Abs. 78:1973;254. [cited in Ref. [47]].
    • (1973) Chem Abs , vol.78 , pp. 254
    • Repkin, V.D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.