Thermal stability and mechanical properties of arc evaporated ZrN/ZrAlN multilayers

Thin Solid Films

Volumn 519, Issue 2, 2010, Pages 694-699

  Rogstrom L ^a   Johnson, L J S ^a   Johansson, M P ^b   Ahlgren, M ^c   Hultman, L ^a   Oden M ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b SECO TOOLS AB   (Sweden)

^c Sandvik Tooling Sverige AB   (Sweden)

Author keywords

Arc evaporation; Hardness; Multilayer; TEM; Thin films; Zr Al N

Indexed keywords

ALN; ARC EVAPORATION; CO-SUBSTRATE; MAXIMUM HARDNESS; NANO-COMPOSITE STRUCTURE; POST-DEPOSITION; SCANNING TRANSMISSION ELECTRON MICROSCOPY; SUB-LAYERS; TEM; THERMAL STABILITY; THERMOGRAVIMETRY; WURTZITES; ZR-AL-N;

AGE HARDENING; ALUMINUM; ANNEALING; COBALT; DIFFERENTIAL SCANNING CALORIMETRY; EVAPORATION; FILM PREPARATION; HARDNESS; MASS SPECTROMETRY; MECHANICAL PROPERTIES; MULTILAYERS; NANOCOMPOSITES; NANOINDENTATION; THERMODYNAMIC STABILITY; THERMOGRAVIMETRIC ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; ZINC SULFIDE; ZIRCONIUM;

MULTILAYER FILMS;

EID: 77958467201     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.08.119     Document Type: Article

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