Formation of hydroxyl and water layers on MgO films studied with ambient pressure XPS

Surface Science

Volumn 605, Issue 1-2, 2011, Pages 89-94

  Newberg, John T ^a   Starr, David E ^b   Yamamoto, Susumu ^c   Kaya, Sarp ^c   Kendelewicz, Tom ^d   Mysak, Erin R ^a   Porsgaard, Soeren ^a,e   Salmeron, Miquel B ^a   Brown Jr , Gordon E ^c,d   Nilsson, Anders ^c   Bluhm, Hendrik ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b BROOKHAVEN NATIONAL LABORATORY   (United States)

^c SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^d STANFORD UNIVERSITY   (United States)

^e AARHUS UNIVERSITY   (Denmark)

Author keywords

Catalysis; Geochemistry; Magnesium oxide; Surface chemistry

Indexed keywords

AG(100); AMBIENT CONDITIONS; AMBIENT PRESSURES; IN-SITU; INTENSITY RATIO; INTERFACIAL CHEMISTRY; MAGNESIUM OXIDE; METAL OXIDES; MGO FILMS; MGO(1 0 0); MULTILAYER MODELS; QUANTITATIVE ASSESSMENTS; REACTION MECHANISM; RELATIVE HUMIDITIES; WATER ADSORPTION; WATER LAYERS; XPS;

ADSORPTION; ATMOSPHERIC HUMIDITY; CAPILLARITY; CATALYSIS; DISSOCIATION; GEOCHEMISTRY; HYDROXYLATION; MAGNESIUM; METALLIC COMPOUNDS; MONOLAYERS; SURFACE CHEMISTRY; X RAY PHOTOELECTRON SPECTROSCOPY;

SILVER;

EID: 78649671760     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2010.10.004     Document Type: Article

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