Adsorption and reaction of HfCl4 with H2O-terminated Si(100)-2×1

Journal of Physical Chemistry C

Volumn 112, Issue 6, 2008, Pages 1994-2003

  Willis, B G ^a   Mathew, A ^b   Wielunski, L S ^c   Opila, R L ^b  

^a University of Delaware   (United States)

^b DUPONT COMPANY   (United States)

^c RUTGERS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BONDING ARRANGEMENTS; SATURATION COVERAGE;

ADSORPTION; DENSITY FUNCTIONAL THEORY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON COMPOUNDS; WATER; X RAY PHOTOELECTRON SPECTROSCOPY;

HAFNIUM COMPOUNDS;

EID: 40049097504     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp0758317     Document Type: Article

References (40)