-
1
-
-
51349084024
-
High performance indium gallium zinc oxide thin film transistors fabricated on polyethylene terephthalate substrates
-
Aug.
-
W. Lim, J. H. Jang, S.-H. Kim, D. P. Norton, V. Craciun, S. J. Pearton, F. Ren, and H. Shen, "High performance indium gallium zinc oxide thin film transistors fabricated on polyethylene terephthalate substrates," Appl. Phys. Lett., vol. 93, no. 8, pp. 0821021-0821023, Aug. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.93
, Issue.8
, pp. 0821021-0821023
-
-
Lim, W.1
Jang, J.H.2
Kim, S.-H.3
Norton, D.P.4
Craciun, V.5
Pearton, S.J.6
Ren, F.7
Shen, H.8
-
2
-
-
77954145410
-
Low-voltage-driven flexible InGaZnO thinfilm transistor with small subthreshold swing
-
Jul.
-
N.-C. Su, S.-J. Wang, C.-C. Huang, Y.-H. Chen, H.-Y. Huang, C.-K. Chiang, and A. Chin, "Low-voltage-driven flexible InGaZnO thinfilm transistor with small subthreshold swing," IEEE Electron Devices Lett., vol. 31, no. 7, pp. 680-682, Jul. 2010.
-
(2010)
IEEE Electron Devices Lett.
, vol.31
, Issue.7
, pp. 680-682
-
-
Su, N.-C.1
Wang, S.-J.2
Huang, C.-C.3
Chen, Y.-H.4
Huang, H.-Y.5
Chiang, C.-K.6
Chin, A.7
-
3
-
-
9744248669
-
Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
-
DOI 10.1038/nature03090
-
K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, and H. Hosono, "Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors," Nature, vol. 432, no. 7016, pp. 488-492, Nov. 2004. (Pubitemid 39585210)
-
(2004)
Nature
, vol.432
, Issue.7016
, pp. 488-492
-
-
Nomura, K.1
Ohta, H.2
Takagi, A.3
Kamiya, T.4
Hirano, M.5
Hosono, H.6
-
4
-
-
54949116604
-
Thickness dependence of gate dielectric and active semiconductor on InGaZnO4 TFT fabricated on plastic substrates
-
Sep.
-
D. H. Kim, N. G. Cho, S. H. Han, H.-G. Kim, and I.-D. Kim, "Thickness dependence of gate dielectric and active semiconductor on InGaZnO4 TFT fabricated on plastic substrates," Electrochem. Solid-State Lett., vol. 11, no. 12, pp. H317-H319, Sep. 2008.
-
(2008)
Electrochem. Solid-State Lett.
, vol.11
, Issue.12
-
-
Kim, D.H.1
Cho, N.G.2
Han, S.H.3
Kim, H.-G.4
Kim, I.-D.5
-
5
-
-
78149443812
-
Stretchable, transparent zinc oxide thin film transistors
-
Oct.
-
K. Park, D.-K. Lee, B.-S. Kim, H. Jeon, N.-E. Lee, D. Whang, H.-J. Lee, Y. J. Kim, and J.-H. Ahn, "Stretchable, transparent zinc oxide thin film transistors," Adv. Funct. Mater., vol. 20, no. 20, pp. 3577-3582, Oct. 2010.
-
(2010)
Adv. Funct. Mater.
, vol.20
, Issue.20
, pp. 3577-3582
-
-
Park, K.1
Lee, D.-K.2
Kim, B.-S.3
Jeon, H.4
Lee, N.-E.5
Whang, D.6
Lee, H.-J.7
Kim, Y.J.8
Ahn, J.-H.9
-
6
-
-
79551552419
-
Instabilities in amorphous oxide semiconductor thin film transistors
-
Dec.
-
J. F. Conley, Jr, "Instabilities in amorphous oxide semiconductor thin film transistors," IEEE Trans. Device Mater. Rel., vol. 10, no. 4, pp. 460-475, Dec. 2010.
-
(2010)
IEEE Trans. Device Mater. Rel.
, vol.10
, Issue.4
, pp. 460-475
-
-
Conley Jr., J.F.1
-
7
-
-
67649229450
-
High stability InGaZnO4 thin-film transistors using sputter-deposited PMMA gate insulators and PMMA passivation layers
-
May
-
D. H. Kim, S.-H. Choi, N. G. Cho, Y. E. Chang, H.-G. Kim, J.-M. Hong, and I.-D. Kim, "High stability InGaZnO4 thin-film transistors using sputter-deposited PMMA gate insulators and PMMA passivation layers," Electrochem. Solid State Lett., vol. 12, no. 8, pp. H296-H298, May 2009.
-
(2009)
Electrochem. Solid State Lett.
, vol.12
, Issue.8
-
-
Kim, D.H.1
Choi, S.-H.2
Cho, N.G.3
Chang, Y.E.4
Kim, H.-G.5
Hong, J.-M.6
Kim, I.-D.7
-
8
-
-
60049090771
-
Passivation of bottom-gate IGZO thin film transistors
-
Jan.
-
D. H. Cho, S. H. Yang, J.-H. Shin, C.W. Byun, M. K. Ryu, J. I. Lee, C. S. Hwang, and H. Y. Chu, "Passivation of bottom-gate IGZO thin film transistors," J. Korean Phys. Soc., vol. 54, no. 925, pp. 531-534, Jan. 2009.
-
(2009)
J. Korean Phys. Soc.
, vol.54
, Issue.925
, pp. 531-534
-
-
Cho, D.H.1
Yang, S.H.2
Shin, J.-H.3
Byun, C.W.4
Ryu, M.K.5
Lee, J.I.6
Hwang, C.S.7
Chu, H.Y.8
-
9
-
-
50249129272
-
New approach for passivation of Ga2O3-In2O3-ZnO thin film transistors
-
Dec.
-
S. I. Kim, C. J. Kim, J. C. Park, I. Song, D. H. Kang, H. Lim, S. W. Kim, E. Lee, J. C. Lee, and Y. Park, "New approach for passivation of Ga2O3-In2O3-ZnO thin film transistors," IEEE Int. Electron Dev. Meeting Tech. Digest, pp. 583-586, Dec. 2007.
-
(2007)
IEEE Int. Electron Dev. Meeting Tech. Digest
, pp. 583-586
-
-
Kim, S.I.1
Kim, C.J.2
Park, J.C.3
Song, I.4
Kang, D.H.5
Lim, H.6
Kim, S.W.7
Lee, E.8
Lee, J.C.9
Park, Y.10
-
10
-
-
56049127394
-
Threshold voltage control of amorphous gallium indium zinc oxide TFTs by suppressing backchannel current
-
Nov.
-
K.-S. Son, T.-S. Kim, J.-S. Jung, M.-K. Ryu, K.-B. Park, B.-W. Yoo, K. Park, J.-Y. Kwon, S.-Y. Lee, and J.-M. Kim, "Threshold voltage control of amorphous gallium indium zinc oxide TFTs by suppressing backchannel current," Electrochem. Solid State Lett., vol. 12, no. 1, pp. H26-H28, Nov. 2008.
-
(2008)
Electrochem. Solid State Lett.
, vol.12
, Issue.1
-
-
Son, K.-S.1
Kim, T.-S.2
Jung, J.-S.3
Ryu, M.-K.4
Park, K.-B.5
Yoo, B.-W.6
Park, K.7
Kwon, J.-Y.8
Lee, S.-Y.9
Kim, J.-M.10
-
11
-
-
52949097961
-
Origin of threshold voltage instability in indium-gallium-zinc oxide thin film transistors
-
Sep.
-
J. K. Jeong, H. W. Yang, J. H. Jeong, Y. G. Mo, H. D. Kim, J. K. Jeong, H.W. Yang, J. H. Jeong, Y. G. Mo, and H. D. Kim, "Origin of threshold voltage instability in indium-gallium-zinc oxide thin film transistors," Appl. Phys. Lett., vol. 93, no. 12, pp. 1235081-1235083, Sep. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.93
, Issue.12
, pp. 1235081-1235083
-
-
Jeong, J.K.1
Yang, H.W.2
Jeong, J.H.3
Mo, Y.G.4
Kim, H.D.5
Jeong, J.K.6
Yang, H.W.7
Jeong, J.H.8
Mo, Y.G.9
Kim, H.D.10
-
12
-
-
77949352372
-
Improvement in bias stability of amorphous-InGaZnO thin film transistors with SiO passivation layers
-
Jan.
-
W. Lim, E. A. Douglas, D. P. Norton, S. J. Pearton, F. Ren, Y.-W. Heo, S. Y. Son, and J. H. Yuh, "Improvement in bias stability of amorphous-InGaZnO thin film transistors with SiO passivation layers," J. Vac. Sci. Technol. B, vol. 28, no. 1, pp. 116-119, Jan. 2010.
-
(2010)
J. Vac. Sci. Technol. B
, vol.28
, Issue.1
, pp. 116-119
-
-
Lim, W.1
Douglas, E.A.2
Norton, D.P.3
Pearton, S.J.4
Ren, F.5
Heo, Y.-W.6
Son, S.Y.7
Yuh, J.H.8
-
13
-
-
39749191514
-
Electronic transport properties of amorphous indium-gallium-zinc oxide semiconductor upon exposure to water
-
Feb.
-
J.-S. Park, J. K. Jeong, H.-J. Chung, Y.-G. Mo, and H. D. Kim, "Electronic transport properties of amorphous indium-gallium-zinc oxide semiconductor upon exposure to water," Appl. Phys. Lett., vol. 92, no. 7, pp. 0721041-0721043, Feb. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.92
, Issue.7
, pp. 0721041-0721043
-
-
Park, J.-S.1
Jeong, J.K.2
Chung, H.-J.3
Mo, Y.-G.4
Kim, H.D.5
-
14
-
-
77949731627
-
Effects of ambient atmosphere on the transfer characteristics and gate-bias stress stability of amorphous indium-gallium-zinc oxide thin-film transistors
-
Mar.
-
S.-Y. Sung, J. H. Choi, U. B. Han, K. C. Lee, J.-H. Lee, J.-J. Kim,W. Lim, S. J. Pearton, D. P. Norton, and Y.-W. Heo, "Effects of ambient atmosphere on the transfer characteristics and gate-bias stress stability of amorphous indium-gallium-zinc oxide thin-film transistors," Appl. Phys. Lett., vol. 96, no. 10, pp. 1021071-1021073, Mar. 2010.
-
(2010)
Appl. Phys. Lett.
, vol.96
, Issue.10
, pp. 1021071-1021073
-
-
Sung, S.-Y.1
Choi, J.H.2
Han, U.B.3
Lee, K.C.4
Lee, J.-H.5
Kimw. Lim, J.-J.6
Pearton, S.J.7
Norton, D.P.8
Heo, Y.-W.9
-
15
-
-
20444458036
-
Ink-jet printing, self-assembled polyelectrolytes, and electroless plating: Low cost fabrication of circuits on a flexible substrate at room temperature
-
DOI 10.1002/marc.200400462
-
K. Cheng, M.-H. Yang, W. W. W. Chiu, C.-Y. Huang, J. Chang, T.-F. Ying, and Y. Yang, "Ink-jet printing, self-assembled polyelectrolytes, and electroless plating: Low cost fabrication of circuits on a flexible substrate at room temperature," Macromol. Rapid Commun., vol. 26, no. 4, pp. 247-264, Feb. 2005. (Pubitemid 40812076)
-
(2005)
Macromolecular Rapid Communications
, vol.26
, Issue.4
, pp. 247-264
-
-
Cheng, K.1
Yang, M.-H.2
Chiu, W.W.W.3
Huang, C.-Y.4
Chang, J.5
Ying, T.-F.6
Yang, Y.7
-
16
-
-
77049127582
-
Air stable cross-linked cytop ultrathin gate dielectric for high yield low-voltage top-gate organic field-effect transistors
-
Jan.
-
X. Cheng, M. Caironi, Y.-Y. Noh, J. Wang, C. Newman, H. Yan, A. Facchetti, and H. Sirringhaus, "Air stable cross-linked cytop ultrathin gate dielectric for high yield low-voltage top-gate organic field-effect transistors," Chem. Mater., vol. 22, no. 4, pp. 1559-1566, Jan. 2010.
-
(2010)
Chem. Mater.
, vol.22
, Issue.4
, pp. 1559-1566
-
-
Cheng, X.1
Caironi, M.2
Noh, Y.-Y.3
Wang, J.4
Newman, C.5
Yan, H.6
Facchetti, A.7
Sirringhaus, H.8
-
17
-
-
33847658220
-
Organic small molecule field-effect transistors with cytop gate dielectric: Eliminating gate bias stress effects
-
Feb.
-
W. L. Kalb, T. Mathis, S. Haas, A. F. Stassen, and B. Batlogg, "Organic small molecule field-effect transistors with cytop gate dielectric: Eliminating gate bias stress effects," Appl. Phys. Lett., vol. 90, no. 9, pp. 092104-1-092104-3, Feb. 2007.
-
(2007)
Appl. Phys. Lett.
, vol.90
, Issue.9
, pp. 0921041-0921043
-
-
Kalb, W.L.1
Mathis, T.2
Haas, S.3
Stassen, A.F.4
Batlogg, B.5
-
18
-
-
67349115977
-
Improvement of on-off-Current Ratio in TiOx active-channel TFTs using N2O plasma treatment
-
Apr.
-
J.-W. Park, D. G. Lee, H. K. Kwon, and S. H. Yoo, "Improvement of on-off-Current Ratio in TiOx active-channel TFTs using N2O plasma treatment," IEEE Electron Devices Lett., vol. 30, no. 4, pp. 362-364, Apr. 2009.
-
(2009)
IEEE Electron Devices Lett.
, vol.30
, Issue.4
, pp. 362-364
-
-
Park, J.-W.1
Lee, D.G.2
Kwon, H.K.3
Yoo, S.H.4
-
19
-
-
77956364501
-
Solvent-mediated threshold voltage shift in solution-processed transparent oxide thin-film transistors
-
Aug.
-
Y.-H. Kim, H. S. Kim, J.-I. Han, and S. K. Park, "Solvent-mediated threshold voltage shift in solution-processed transparent oxide thin-film transistors," Appl. Phys. Lett., vol. 97, no. 9, pp. 0921051-0921053, Aug. 2010.
-
(2010)
Appl. Phys. Lett.
, vol.97
, Issue.9
, pp. 0921051-0921053
-
-
Kim, Y.-H.1
Kim, H.S.2
Han, J.-I.3
Park, S.K.4
-
20
-
-
8444231667
-
Gate insulators in organic field-effect transistors
-
Sep.
-
J. Veres, S. Ogier, and G. Lloyd, "Gate insulators in organic field-effect transistors," Chem. Mater., vol. 16, no. 23, pp. 4543-4555, Sep. 2004.
-
(2004)
Chem. Mater.
, vol.16
, Issue.23
, pp. 4543-4555
-
-
Veres, J.1
Ogier, S.2
Lloyd, G.3
-
21
-
-
0028443708
-
Stress-controlled silicon nitride film with high optical transmittance prepared by an ultrahigh-vacuum electron cyclotron resonance plasma chemical-vapor deposition system
-
Jun.
-
J. H. Ahn and K. Suzuki, "Stress-controlled silicon nitride film with high optical transmittance prepared by an ultrahigh-vacuum electron cyclotron resonance plasma chemical-vapor deposition system," Appl. Phys. Lett., vol. 64, no. 24, pp. 3249-3251, Jun. 1994.
-
(1994)
Appl. Phys. Lett.
, vol.64
, Issue.24
, pp. 3249-3251
-
-
Ahn, J.H.1
Suzuki, K.2
-
22
-
-
53649109662
-
Impact of hydrogenation of ZnO TFTs by plasma-deposited silicon nitride gate dielectric
-
Oct.
-
K. Remashan, D.-K. Hwang, S.-J. Park, and J.-H. Jang, "Impact of hydrogenation of ZnO TFTs by plasma-deposited silicon nitride gate dielectric," IEEE Trans. Electron Devices, vol. 55, no. 10, pp. 2736-2743, Oct. 2008.
-
(2008)
IEEE Trans. Electron Devices
, vol.55
, Issue.10
, pp. 2736-2743
-
-
Remashan, K.1
Hwang, D.-K.2
Park, S.-J.3
Jang, J.-H.4
-
23
-
-
0035693512
-
0.47As
-
DOI 10.1109/94.971459
-
C.-C. Lu, C.-L. Ho, M.-C. Wu, T.-T. Shi, and W.-J. Ho, "Electrical characterization of SiOx and SiNx prepared by PECVD technique on In0.53Ga0.47As," IEEE Trans. Dielec. Elect. Insul., vol. 8, no. 6, pp. 1011-1015, Dec. 2001. (Pubitemid 34069179)
-
(2001)
IEEE Transactions on Dielectrics and Electrical Insulation
, vol.8
, Issue.6
, pp. 1011-1015
-
-
Lu, C.-C.1
Ho, C.-L.2
Wu, M.-C.3
Shi, T.-T.4
Ho, W.-J.5
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