SCOPUS 정보 검색 플랫폼

Nanotechnology

Volumn 23, Issue 27, 2012, Pages

Enhancement in broadband and quasi-omnidirectional antireflection of nanopillar arrays by ion milling

(3) Huang, Zhifeng a Hawkeye, Matthew M b Brett, Michael J b,c

a HONG KONG BAPTIST UNIVERSITY (Hong Kong)

b UNIVERSITY OF ALBERTA (Canada)

c NATIONAL RESEARCH COUNCIL CANADA (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE OF INCIDENCE; ANTI-REFLECTION; BOTTOM-UP FABRICATION; CRYSTALLOGRAPHIC STRUCTURE; ENGINEERING PROCESS; FIELD OF VIEWS; GLANCING ANGLE DEPOSITION; IMPEDANCE MATCH; INTEGRATED TECHNIQUES; ION MILLING; MASS REDISTRIBUTION; NANO-PILLAR ARRAYS; POST-DEPOSITION; REFLECTION LOSS; STRUCTURE TRANSFORMATIONS; TAPERED GEOMETRY; TIO; TOPDOWN; WAVELENGTH RANGES;

ANTIREFLECTION COATINGS; BIOMIMETICS; COMPETITION; ION BOMBARDMENT; REFRACTIVE INDEX; STOICHIOMETRY; TITANIUM DIOXIDE;

MILLING (MACHINING);

ION; NANOMATERIAL;

ARTICLE; CHEMISTRY; LIGHT; MATERIALS TESTING; METHODOLOGY; PARTICLE SIZE; RADIATION SCATTERING; REFRACTOMETRY; SURFACE PLASMON RESONANCE; SURFACE PROPERTY; ULTRASTRUCTURE;

IONS; LIGHT; MATERIALS TESTING; NANOSTRUCTURES; PARTICLE SIZE; REFRACTOMETRY; SCATTERING, RADIATION; SURFACE PLASMON RESONANCE; SURFACE PROPERTIES;

EID: 84862663637 PISSN: 09574484 EISSN: 13616528 Source Type: Journal
DOI: 10.1088/0957-4484/23/27/275703 Document Type: Article

Times cited : (14)

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