A wide-angle antireflection surface for the visible spectrum

Nanotechnology

Volumn 20, Issue 37, 2009, Pages

  Paivanranta B ^a   Saastamoinen, T ^a   Kuittinen, M ^a  

^a UNIVERSITY OF EASTERN FINLAND   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ANTI-REFLECTION; ANTIREFLECTION SURFACES; BROAD BANDS; CRYSTALLINE ORIENTATIONS; NANOPYRAMIDS; RIGOROUS DIFFRACTION THEORY; SILICON DIOXIDE; VIEWING ANGLE; VISIBLE SPECTRA; VISIBLE SPECTRAL RANGE; WET-ETCHING PROCESS;

SILICA;

REACTIVE ION ETCHING;

ION; SILICON DIOXIDE; SILICON;

ARTICLE; CRYSTAL; CRYSTALLOGRAPHY; DIFFRACTION; MATHEMATICAL ANALYSIS; NANOTECHNOLOGY; PRIORITY JOURNAL; REFLECTOMETRY; SCANNING ELECTRON MICROSCOPY; STRUCTURE ANALYSIS; SURFACE PROPERTY; CHEMISTRY; CRYSTALLIZATION; METHODOLOGY;

CRYSTALLIZATION; NANOTECHNOLOGY; SILICON; SILICON DIOXIDE; SURFACE PROPERTIES;

EID: 70349127775     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/37/375301     Document Type: Article

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