Critical height and growth mode in epitaxial copper nanowire arrays fabricated using glancing angle deposition

Applied Physics Letters

Volumn 86, Issue 12, 2005, Pages 1-3

  Alouach, H ^a   Mankey, G J ^a  

^a UNIVERSITY OF ALABAMA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GLANCING ANGLE DEPOSITION; GROWTH MECHANISMS; GROWTH MODE; NANOWIRES;

ARRAYS; COPPER; DEPOSITION; HYDROGEN; NANOSTRUCTURED MATERIALS; SILICON; THIN FILMS; X RAY CRYSTALLOGRAPHY;

EPITAXIAL GROWTH;

EID: 17944374328     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1891287     Document Type: Article

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