Film morphology modification in ion-assisted glancing angle deposition

Thin Solid Films

Volumn 519, Issue 4, 2010, Pages 1356-1360

  Sorge, J B ^a   Brett, M J ^a,b  

^a UNIVERSITY OF ALBERTA   (Canada)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

Optical properties; Silicon dioxide; Thin films; Titanium dioxide

Indexed keywords

ADDITIONAL CONTROL; COLUMNAR STRUCTURES; COLUMNAR THIN FILMS; DEPOSITION ANGLE; DEVICE APPLICATION; FABRICATION PROCESS; FILM DENSITY; FILM MORPHOLOGY; FILM STRUCTURE; GLANCING ANGLE DEPOSITION; GLANCING ANGLE DEPOSITION TECHNIQUE; ION ASSISTANCE; ION ASSISTED DEPOSITION; ION DOSE; MOTION ALGORITHM; OPTICAL CHARACTERIZATION; POROUS SILICON DIOXIDE; SILICON DIOXIDE; STRUCTURAL AND OPTICAL PROPERTIES; STRUCTURED FILMS; TILT ANGLE;

DEPOSITION; ION BEAM ASSISTED DEPOSITION; IONS; MORPHOLOGY; OPTICAL INSTRUMENTS; OPTICAL PROPERTIES; POROUS SILICON; SEMICONDUCTING SILICON COMPOUNDS; SILICA; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; VAPOR DEPOSITION;

OPTICAL FILMS;

EID: 78349303956     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.09.054     Document Type: Article

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