Nano-patterning using an embedded particle monolayer as an etch mask

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1503-1508

  Nakanishi, Tsutomu ^a   Hiraoka, Toshiro ^a   Fujimoto, Akira ^a   Saito, Satoshi ^a   Asakawa, Koji ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Antireflection surface; Monolayer; Moth eye; Nanoscale engineering; Nanotechnology; Particle; Patterning; Reactive ion etching; Self assembling

Indexed keywords

ELEMENTARY PARTICLES; MONOLAYERS; NANOSTRUCTURED MATERIALS; REACTIVE ION ETCHING; SELF ASSEMBLY; SILICA; SURFACE PROPERTIES;

ANTIREFLECTION SURFACES; EMBEDDED PARTICLE MONOLAYER (EPM); MOTH EYE; NANOSCALE ENGINEERING;

NANOTECHNOLOGY;

EID: 33748251921     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.193     Document Type: Article

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