Nanoimprint lithography and future patterning for semiconductor devices

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 10, Issue 4, 2011, Pages

  Higashiki, Tatsuhiko ^a   Nakasugi, Tetsuro ^a   Yoneda, Ikuo ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Critical dimension uniformity; Defectivity; Lithography; Lithography investment; Nanoimprint; Overlay accuracy; Template

Indexed keywords

DEFECTS; LITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE;

CRITICAL DIMENSION UNIFORMITIES; DEFECTIVITY; NANO-IMPRINT; OVERLAY ACCURACY; TEMPLATE;

NANOIMPRINT LITHOGRAPHY;

EID: 84861792759     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3658024     Document Type: Article

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