Correction technique of EBM-6000 prepared for EUV mask writing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Yoshitake, Shusuke ^a   Sunaoshi, Hitoshi ^a   Yashima, Jun ^a   Tamamushi, Shuichi ^a   Ogasawara, Munehiro ^b  

^a NUFLARE TECHNOLOGY INC   (Japan)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

EB mask writer; Electro static chuck; EUV lithography; Image placement accuracy; OBBTC

Indexed keywords

ERROR ANALYSIS; EXTREME ULTRAVIOLET LITHOGRAPHY; OPTIMIZATION; PATTERN MATCHING;

EB MASK WRITER; ELECTRO-STATIC CHUCK; IMAGE PLACEMENT ACCURACY; OBBTC;

IMAGE ANALYSIS;

EID: 42149111279     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.747748     Document Type: Conference Paper

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