Novel one-component positive-tone chemically amplified I-line molecular glass photoresists

ACS Applied Materials and Interfaces

Volumn 4, Issue 5, 2012, Pages 2591-2596

  Yu, Jinxing ^a   Xu, Na ^a   Liu, Zhengping ^a   Wang, Liyuan ^a  

^a BEIJING NORMAL UNIVERSITY   (China)

Author keywords

chemically amplified; i line; molecular glass; photolithography; Photoresist

Indexed keywords

ACID-LABILE; CARBOXYLIC ACID GROUPS; CHEMICALLY AMPLIFIED; CYCLOADDITION REACTION; DEPROTECTION; EXPOSURE SYSTEM; I-LINE; MOLECULAR GLASS; POSITIVE-TONE; SULFONIC ACID; VINYL ETHERS;

CARBOXYLIC ACIDS; CHLORINE COMPOUNDS; CYCLOADDITION; ETHERS; KETONES; MALEIC ANHYDRIDE; PHOTOLITHOGRAPHY; PHOTOLYSIS; PHOTORESISTS;

GLASS;

EID: 84861438414     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am300259g     Document Type: Article

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