Synthesis of i- and g-line sensitive photoacid generators and their application to photopolymer systems

Journal of Photopolymer Science and Technology

Volumn 16, Issue 1, 2003, Pages 91-96

  Iwashima, Chiaki ^a   Imai, Genji ^a   Okamura, Haruyuki ^b   Tsunooka, Masahiro ^b   Shirai, Masamitsu ^b  

^a KANSAI PAINT CO LTD   (Japan)

^b Osaka Prefecture University   (Japan)

Author keywords

Absorption; g line; i line; Photoacid generators; Photoresist

Indexed keywords

ACID; POLYMER;

ARTICLE; CATALYSIS; CATALYST; CROSS LINKING; EVALUATION; GENERATOR; PHOTOLYSIS; PHOTOREACTIVITY; PHOTOSENSITIVITY; POLYMERIZATION; SYNTHESIS;

EID: 0037492899     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.16.91     Document Type: Article

References (12)

1. M. Shirai, M. Tsunooka, Bull. Chem. Soc. Jpn., 71 (1998) 2483.
2. F. M. Houlihan, E. Chin, O. Nalamasu, J. M. Kometani, T. X. Neenan, A. Pangborn, Proc. SPIE., 2195 (1994) 137.
3. M. L. Schilling, H. E. Katz, F. M. Houlihan, J. M. Kometani, S. M. Stein, O. Nalamasu Proc. SPIE., 2195 (1994) 182.
4. J. V. Crivello, J. H. W. Lam, J. Polym. Sci. Polym. Chem. Ed., 17 (1979) 1047.
5. J. V. Crivello, J. H. W. Lam, J. Polym. Sci. Polym. Chem. Ed., 17 (1979) 1059.
6. J. V. Crivello, M. Sangermano, Polym. Preprints., 42 (2001) 783.
7. S. L. Ablaza, J. F. Cameron, G. Xu, W. Yueh, J. Vac. Sci. Technol. B., 18 (2000) 2543.
8. W. Fischer, Helv. Chim. Acta., 74 (1991) 1119.
9. G. B. Guise, W. D. Ollis, J. A. Peacock, J. S. Stephanatou, J. F. Stoddart., J. Chem. Soc. Parkin Trans. I., (1982) 1637.
10. K. Mitra, M. E. Pohl, L. R. MacGillivray, C. L. Barnes, K. S. Gates, J. Org. Chem., 62, (1997) 9361.
11. K. Kawamura, F. Sasaki, J. Photopolym. Sci. Technol., 14 (2001) 265.
12. F. Ortica, J. C. Scaiano, G. Pohlers, J. F. Cameron, A. Zampini, Chem. Mater., 12 (2000) 414.