Novel top-surface imaging process by selective chemisorption of poly(dimethyl siloxane) on diazoketo-functionalized single component photoresist

Macromolecular Rapid Communications

Volumn 29, Issue 5, 2008, Pages 437-441

  Ganesan, Ramakrishnan ^a   Youn, Seul Ki ^a   Kim, Jin Baek ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Diazoketo; Lithography; Photoresist; Top surface imaging

Indexed keywords

ABS RESINS; AMINES; CHEMISORPTION; ETCHING; LITHOGRAPHY; ORGANIC COMPOUNDS; OXYGEN; PHOTORESISTORS; PLASMA ETCHING; POLYMER FILMS; SURFACE TREATMENT;

CARBOXYLIC GROUPS; DIAZOKETO; ETCH MASKS; FUNCTIONALIZED; FUNCTIONALIZED POLYMERS; HIGH RESOLUTIONS; IMAGING PROCESSES; OXYGEN PLASMA ETCHINGS; PATTERN GENERATIONS; SINGLE COMPONENTS; SURFACE IMAGING; UV LIGHTS;

FUNCTIONAL POLYMERS;

EID: 53649087410     PISSN: 10221336     EISSN: 15213927     Source Type: Journal    
DOI: 10.1002/marc.200700694     Document Type: Article

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