The synthesis and properties of N-hydroxy maleopimarimide sulfonate derivatives as PAG and inhibitor for deep UV photoresist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 608-615

  Wang, Liyuan ^a   Wang, Wenjun ^a   Guo, Xin ^a  

^a BEIJING NORMAL UNIVERSITY   (China)

Author keywords

193nm; N hydroxy maleopimarimide; PAG; Photoresist; Sulfonate

Indexed keywords

ABSORPTION; CATALYSIS; LITHOGRAPHY; ORGANIC COMPOUNDS; PHOTOLYSIS; PHOTOSENSITIVITY; ULTRAVIOLET RADIATION;

193NM; N-HYDROXY MALEOPRIMARIMIDE; PHOTOACID GENERATOR (PAG); SULFONATE;

PHOTORESISTS;

EID: 3843107873     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534513     Document Type: Conference Paper

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