Critical thickness and nanoporosity of TiO2 optical thin films

Microporous and Mesoporous Materials

Volumn 160, Issue , 2012, Pages 1-9

  Borras, Ana ^a   Alvarez, Rafael ^a   Sanchez Valencia, Juan R ^a   Ferrer, Javier ^b   Gonzalez Elipe, Agustin R ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

^b CENTRO NACIONAL DE ACELERADORES   (Spain)

Author keywords

Dynamic scaling; Porosity; Refractive index; Titanium dioxide; Water isotherm

Indexed keywords

CYCLOTRONS; ELECTRON CYCLOTRON RESONANCE; FILM THICKNESS; INTELLIGENT SYSTEMS; MICROSTRUCTURE; MONTE CARLO METHODS; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POROSITY; REFRACTIVE INDEX; THIN FILMS; TITANIUM DIOXIDE;

DYNAMIC SCALING; EXPERIMENTAL PARAMETERS; MICROWAVE ELECTRON CYCLOTRON RESONANCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS (PE CVD); PLASMA GAS COMPOSITION; THIN FILM MICROSTRUCTURES; TITANIUM TETRAISOPROPOXIDE; WATER ISOTHERMS;

OPTICAL FILMS;

EID: 84861181597     PISSN: 13871811     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.micromeso.2012.04.035     Document Type: Article

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