On the microstructure of thin films grown by an isotropically directed deposition flux

Journal of Applied Physics

Volumn 108, Issue 6, 2010, Pages

  Alvarez, R ^a   Romero Gomez, P ^a   Gil Rostra, J ^a   Cotrino, J ^a   Yubero, F ^a   Palmero, A ^a   Gonzalez Elipe, A R ^a  

^a UNIVERSITY OF SEVILLE   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION FLUXES; DEPOSITION TECHNIQUE; FILM MORPHOLOGY; LOW ENERGIES; LOW TEMPERATURES; MAIN PROCESS; MONTE CARLO MODEL; REACTIVE MAGNETRON SPUTTERING; THIN FILM MICROSTRUCTURES; TIO;

COMPUTER SIMULATION; MICROSTRUCTURE; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SURFACE TOPOGRAPHY; THIN FILMS; TOPOGRAPHY; VAPOR DEPOSITION;

DEPOSITION;

EID: 77957727202     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3483242     Document Type: Article

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