Synthesis of SiO2 and SiOxCyHz thin films by microwave plasma CVD

Thin Solid Films

Volumn 401, Issue 1-2, 2001, Pages 150-158

  Barranco, A ^a   Cotrino, J ^b   Yubero, F ^a   Espinos J P ^a   Benitez J ^a   Clerc, C ^c   Gonzalez Elipe A R ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

^b UNIVERSITY OF SEVILLE   (Spain)

^c CENTRE DE CALCUL DE L INSTITUT NATIONAL DE PHYSIQUE NUCLEAIRE ET DE PHYSIQUE DES PARTICULES   (France)

Author keywords

Chemical vapour deposition (CVD); Plasma processing and deposition; Silicon oxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL MICROSTRUCTURE; ELECTRON CYCLOTRON RESONANCE; EMISSION SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICA; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

ELECTRON RECOIL DETECTION ANALYSIS (ERDA);

THIN FILMS;

EID: 0035904908     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01632-7     Document Type: Article

References (19)