Phase formation in the tantalum carbonitride film deposited with atomic layer deposition using ammonia

Journal of the Electrochemical Society

Volumn 155, Issue 10, 2008, Pages

  Song, Moon Kyun ^a   Rhee, Shi Woo ^a,b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; ATOMIC PHYSICS; ATOMS; CARBON NITRIDE; CHEMICAL VAPOR DEPOSITION; NITRIDES; PLASMA DEPOSITION; PULSED LASER DEPOSITION; SILICON; TANTALUM; TANTALUM COMPOUNDS; THICK FILMS; TRANSITION METALS;

ATOMIC LAYER DEPOSITIONS; CARBONITRIDE; PHASE FORMATIONS; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; SI O2 SURFACE; THIN FILMS;

ATOMIC LAYER DEPOSITION;

EID: 51849093498     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2967333     Document Type: Article

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