High-k gate dielectrics

Electrochemical Society Interface

Volumn 14, Issue 2, 2005, Pages 30-34

  Misra, Durga ^a   Iwai, Hiroshi ^b,c   Wong, Hei ^d  

^a NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^c IEEE

^d CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYERS; CONDUCTION BANDS; SILICON GATE OXIDE; THICK DIELECTRIC FILMS;

CMOS INTEGRATED CIRCUITS; CRYSTALLINE MATERIALS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SILICON; TRANSITION METALS; X RAY PHOTOELECTRON SPECTROSCOPY;

DIELECTRIC MATERIALS;

EID: 23244462592     PISSN: 10648208     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Review

References (12)

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