Improved electrical performances of plasma-enhanced atomic layer deposited TaCx Ny films by adopting Ar H2 plasma

Applied Physics Letters

Volumn 91, Issue 25, 2007, Pages

  Park, Tae Joo ^a   Kim, Jeong Hwan ^a   Jang, Jae Hyuck ^a   Na, Kwang Duk ^a   Hwang, Cheol Seong ^a   Kim, Jong Hoon ^b   Kim, Gee Man ^b   Choi, Jae Ho ^b   Choi, Kang Joon ^b   Jeong, Jae Hak ^b  

^a Seoul National University   (South Korea)

^b Process Development Division   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; DIFFUSION; FILM GROWTH; OXYGEN; PLASMAS;

ELEMENTAL DIFFUSION; REDUCING AGENT; TA-N BONDS;

THIN FILMS;

EID: 37549061390     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2825272     Document Type: Article

References (13)

1. C. C. Chang, J. S. Jeng, and J. S. Chen, Thin Solid Films 413, 46 (2002).
2. M. Zier, S. Oswald, R. Reiche, and K. Wetzig, Appl. Surf. Sci. 252, 234 (2005).
3. M. H. Tsai, S. C. Sun, H. T. Chiu, C. E. Tsai, and S. H. Chuang, Appl. Phys. Lett. 67, 1128 (1995).
4. Y. Kim, A. Baunemann, H. Parala, A. Devi, and R. A. Fischer, Chem. Vap. Deposition 11, 294 (2005).
5. J. H. Jang, T. J. Park, J. H. Kim, K. D. Na, W. Y. Park, M. Kim, and C. S. Hwang (unpublished).
6. C. Zhao, T. Schram, A. Van Ammel, T. Conard, S. De Gendt, and N. Yamada, Solid-State and Integrated Circuit Technology (ICSICT, 2006), pp. 418-420.
7. T. Call, in Carbide, Nitride and Boride Material Synthesis and Processing, edited by, A. W. Weimer, (Chapman and Hall, New York, 1997), p. 653.
8. J. A. Wilks, N. P. MAgtoto, J. A. Kelber, and V. Arunachalam, Appl. Surf. Sci. 6176, 253 (2007).
9. J. W. Nah, W. S. Choi, S. K. Hwang, and C. M. Lee, Surf. Coat. Technol. 123, 1 (2000).
10. E. R. Engbrecht, Y.-M. Sun, S. Smith, K. Pfeifer, J. Bennett, J. M. White, and J. G. Ekerdt, Thin Solid Films 418, 145 (2002).
11. E. A. Brades and G. B. Brook, in Smithells Materials References Book, 7th ed. (Butterworths, London, 1992), Vol. 8, p. 23.
12. J.-S. Park, H.-S. Park, and S.-W. Kang, J. Electrochem. Soc. 149, C28 (2002).
13. X. Zhao, N. P. Magtoto, and J. A. Kelber, Thin Solid Films 478, 188 (2005).