Fabrication of a low resistivity tantalum nitride thin film

Microelectronic Engineering

Volumn 83, Issue 2, 2006, Pages 206-212

  Shen, Hong ^a   Ramanathan, Ravi ^a  

^a SKYWORKS SOLUTIONS INC   (United States)

Author keywords

Barrier layer; DC sputtering; Glancing angle XRD; TaN; Thin film resistor

Indexed keywords

CRYSTALLINE MATERIALS; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; NITRIDES; RESISTORS; SPUTTERING; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

BARRIER LAYERS; DC SPUTTERING; GLANCING ANGLE XRD; TAN; THIN FILM RESISTORS;

TANTALUM COMPOUNDS;

EID: 32044457697     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.08.006     Document Type: Article

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