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Volumn 99, Issue 6, 2011, Pages

Conduction mechanism of TiNHfO xPt resistive switching memory: A trap-assisted-tunneling model

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTION MECHANISM; EXPERIMENTAL DATA; IV CHARACTERISTICS; MEMORY STACK; METAL OXIDES; POOLE-FRENKEL MODEL; RESISTIVE SWITCHING MEMORIES; STATE-DEPENDENT; SWITCHING VOLTAGES; TRAP ENERGY; TUNNELING DISTANCE;

EID: 84856981036     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3624472     Document Type: Article
Times cited : (364)

References (21)
  • 1
    • 78649340782 scopus 로고    scopus 로고
    • 10.1109/JPROC.2010.2070830
    • H. Akinaga and H. Shima, Proc. IEEE 98, 2237 (2010). 10.1109/JPROC.2010. 2070830
    • (2010) Proc. IEEE , vol.98 , pp. 2237
    • Akinaga, H.1    Shima, H.2
  • 13
    • 0036477562 scopus 로고    scopus 로고
    • Current transport in metal/hafnium oxide/silicon structure
    • DOI 10.1109/55.981318, PII S0741310602014921
    • W. J. Zhu, T.-P. Ma, T. Tamagawa, J. Kim, and Y. Di, IEEE Electron Device Lett. 23, 97 (2002). 10.1109/55.981318 (Pubitemid 34504411)
    • (2002) IEEE Electron Device Letters , vol.23 , Issue.2 , pp. 97-99
    • Zhu, W.J.1    Ma, T.-P.2    Tamagawa, T.3    Kim, J.4    Di, Y.5
  • 18
    • 29144521437 scopus 로고    scopus 로고
    • Tunneling-assisted Poole-Frenkel conduction mechanism in Hf O2 thin films
    • DOI 10.1063/1.2135895, 113701
    • D. S. Jeong and C. S. Hwang, J. Appl. Phys. 98, 113701 (2005). 10.1063/1.2135895 (Pubitemid 41816233)
    • (2005) Journal of Applied Physics , vol.98 , Issue.11 , pp. 1-8
    • Jeong, D.S.1    Hwang, C.S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.