Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification

Materials Chemistry and Physics

Volumn 119, Issue 1-2, 2010, Pages 287-293

  Höfler, Thomas ^a   Track, Anna M ^b,d   Pacher, Peter ^b   Shen, Quan ^c   Flesch, Heinz Georg ^b   Hlawacek, Gregor ^c   Koller, Georg ^d   Ramsey, Michael G ^d   Schennach, Robert ^b   Resel, Roland ^b   Teichert, Christian ^c   Kern, Wolfgang ^c   Trimmel, Gregor ^a   Griesser, Thomas ^a,c  

^a GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

^b GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

^c UNIVERSITY OF LEOBEN   (Austria)

^d UNIVERSITY OF GRAZ   (Austria)

Author keywords

Atomic force microscopy (AFM); Infrared spectroscopy (IR); Lithography; Thin films

Indexed keywords

ARYL ESTERS; ATOMIC FORCE MICROSCOPY (AFM); CONTACT MASKS; FRICTION FORCE MICROSCOPY; FRIES REARRANGEMENT; FTIR SPECTROSCOPY; FUNCTIONALIZED; HYDROXY GROUPS; IMMOBILISATION; INORGANIC SURFACES; LAYER FORMATION; MOLECULAR LAYER; ORGANOSILANES; PATTERNED SURFACE; PHOTOPATTERNED; PHOTOREACTIONS; POST-EXPOSURE; POST-MODIFICATION; SILANE LAYERS; SILICON OXIDE SURFACES; THIN LAYERS; UV-LIGHT; UV-PATTERNING; X RAY REFLECTIVITY;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CHEMICAL MODIFICATION; CHEMICAL REACTIVITY; CHLORINE COMPOUNDS; ESTERIFICATION; ESTERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; KETONES; PHOTOREACTIVITY; SILANES; SILICON OXIDES; SPECTROSCOPIC ANALYSIS; THIN FILMS; TRACE ANALYSIS; TUNING; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE PROPERTIES;

EID: 70449115568     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2009.08.065     Document Type: Article

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