Hierarchy of adhesion forces in patterns of photoreactive surface layers

Journal of Chemical Physics

Volumn 130, Issue 4, 2009, Pages

  Hlawacek, Gregor ^a   Shen, Quan ^a   Teichert, Christian ^a   Lex, Alexandra ^b,c   Trimmel, Gregor ^b   Kern, Wolfgang ^a  

^a UNIVERSITY OF LEOBEN   (Austria)

^b GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

^c UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FRICTION; FUNCTIONAL GROUPS; LIGHT EMITTING DIODES; ORGANIC LIGHT EMITTING DIODES (OLED); PHOTOLITHOGRAPHY; THICKNESS MEASUREMENT; THIN FILM DEVICES; THIN FILM TRANSISTORS; TRANSISTORS; WETTING;

ADHESION FORCES; BOTTOM-UP APPROACHES; CHEMICAL INTERACTIONS; CHEMICAL PATTERNS; CHEMICAL SURFACES; COST-EFFICIENT; ELECTRICAL CHARACTERISTICS; FILM SURFACES; FRICTION FORCE MICROSCOPIES; MICRO-METER SCALE; ORGANIC ELECTRONIC DEVICES; ORGANIC LIGHT-EMITTING; ORGANIC THIN FILM TRANSISTORS; PHOTOLITHOGRAPHIC PROCESS; PHOTOSENSITIVE SURFACES; PRECISE CONTROLS; SURFACE FREE ENERGIES; SURFACE LAYERS; TOP DOWNS; UNDERLYING MECHANISMS; WETTING PROPERTIES;

SURFACE PROPERTIES;

EID: 59349110848     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3062841     Document Type: Article

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