Pattern design in large area using octadecyltrichlorosilane self-assembled monolayers as resist material

Applied Surface Science

Volumn 252, Issue 12, 2006, Pages 4230-4235

  Jiang, Peng ^a,b,c   Li, Shun Yu ^a   Sugimura, Hiroyuki ^a   Takai, Osamu ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b AICHI SCIENCE AND TECHNOLOGY FOUNDATION   (Japan)

^c NATIONAL CENTER FOR NANOSCIENCE AND TECHNOLOGY   (China)

Author keywords

Characterization; n Octadecyltrichlorosilane; Self assembled monolayer; Vacuum ultraviolet (VUV) photolithography

Indexed keywords

CHARACTERIZATION; CONTACT ANGLE; DEGRADATION; ELLIPSOMETRY; ETCHING; SELF ASSEMBLY; SILICON; SUBSTRATES; VACUUM APPLICATIONS; WATER; X RAY PHOTOELECTRON SPECTROSCOPY;

LIGHT IRRADIATION; N-OCTADECYLTRICHLOROSILANE (OTS); VACUUM ULTRAVIOLET (VUV) PHOTOLITHOGRAPHY; WATER CONTACT ANGLE MEASUREMENT;

ORGANOMETALLICS;

EID: 33748075154     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.06.030     Document Type: Article

References (26)

1. Ulman A. Chem. Rev. 96 (1996) 1533
2. Sagiv J. J. Am. Chem. Soc. 102 (1980) 92
3. Nuzzo R.G., and Allara D.L. J. Am. Chem. Soc. 105 (1983) 4481
4. DeRosa L., Monetta T., Mitton D.B., and Bellucci F. J. Electrochem. Soc. 145 (1998) 3830
5. Schreiber F. Prog. Surf. Sci. 65 (2000) 151
6. Zamborini F.P., Campbell J.K., and Crooks R.M. Langmuir 14 (1998) 640
7. Zamborini F.P., and Crooks R.M. Langmuir 14 (1998) 3279
8. Itoh M., Nishihara H., and Aramaki K.J. J. Electrochem. Soc. 142 (1995) 1839
9. Heleg-Shabtai V., Katz E., and Willner I. J. Am. Chem. Soc. 119 (1997) 8121
10. Katz E., Heleg-Shabtai V., Willner I., Rau H.K., and Haehnel W. Angew. Chem. Int. Ed. Engl. 37 (1998) 3253
11. Kumar A., Abbott N., Kim E., Biebuyck H., and Whitesides G.M. Acc. Chem. Res. 28 (1995) 219
12. Xia Y., Mrksich M., Kim E., and Whitesides G.M. J. Am. Chem. Soc. 117 (1995) 9576
13. Xia Y., and Whitesides G.M. Angew. Chem. Int. Ed. Engl. 37 (1998) 551
14. Guo Q.J., Teng X.W., Rahman S., and Yang H. J. Am. Chem. Soc. 125 (2003) 630
15. Rao S.G., Huang L., Setyawan W., and Hong S.H. Nature 425 (2003) 36
16. Lahiri J., Ostuni E., and Whitesides G.M. Langmuir 15 (1999) 2055
17. Hyun J.H., and Chilkoti A. J. Am. Chem. Soc. 123 (2001) 6943
18. Hickman J.J., Ofer D., Laibinis P.E., Whitesides G.M., and Wrighton M.S. Science 252 (1991) 688
19. Abbott N.L., Rolison D.R., and Whitesides G.M. Langmuir 10 (1994) 2672
20. Brandow S.L., Schull T.L., Martin B.D., Guerin D.C., and Dressick W.J. Chem. Eur. J. 8 (2002) 5363
21. Dressick W.J., Dulcey C.S., Georger J.H., and Calvert J.M. Chem. Mater. 5 (1993) 148
22. Dressick W.J., and Calvert J.M. Jpn. J. Appl. Phys. 32 (1993) 5829 and references therein
23. Dressick W.J., Dulcey C.S., Chen M.S., and Calvert J.M. Thin Solid Films 285 (1996) 568
24. Dressick W.J., Chen M.S., and Brandow S.L. J. Am. Chem. Soc. 122 (2000) 982
25. Balgar T., Bautista R., Hartmann N., and Hasselbrink E. Surf. Sci. 532-535 (2003) 963
26. Wasserman S.R., Tao Y.-T., and Whitesides G.M. Langmuir 5 (1989) 1074