Patterned self-assembled monolayers on silicon oxide prepared by nanoimprint lithography and their applications in nanofabrication

Advanced Functional Materials

Volumn 15, Issue 3, 2005, Pages 451-457

  Maury, Pascale ^a   Péter, Mária ^a   Mahalingam, Venkataramanan ^a   Reinhoudt, David N ^a   Huskens, Jurriaan ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTROCHEMICAL ELECTRODES; LITHOGRAPHY; MICROMETERS; NANOTECHNOLOGY; PLASMA ETCHING; SILICON COMPOUNDS; SUBSTRATES;

ELECTRON-BEAM LITHOGRAPHY (EBL); NANOIMPRINT LITHOGRAPHY (NIL); PATTERN ENHANCEMENTS; PHYSICAL BARRIERS;

SELF ASSEMBLY;

EID: 15944425759     PISSN: 1616301X     EISSN: None     Source Type: Journal    
DOI: 10.1002/adfm.200400284     Document Type: Article

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