Nanopatterning from the gas phase: High resolution soft lithographic patterning of organosilane thin films

Langmuir

Volumn 25, Issue 23, 2009, Pages 13298-13301

  George, Antony ^a   Blank, Dave H A ^a   Ten Elshof, Johan E ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AMINOSILANES; ARBITRARY SHAPE; CONCAVE SHAPE; FABRICATION ROUTES; FEATURE SIZES; FLAT SURFACES; GASPHASE; HIGH RESOLUTION; LATERAL RESOLUTION; LINE PATTERN; LITHOGRAPHIC PATTERNING; LOW COSTS; NANO-SCALE PATTERNS; NANOPATTERNING; OPEN CHANNELS; ORDER OF MAGNITUDE; ORGANOSILANES; PATTERNED THIN FILMS; PDMS MOLDS; SILICON SUBSTRATES; THREE PHASE BOUNDARY; VAPOR PHASE PRECURSORS;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; MICROCHANNELS; MICROMETERS; SILANES; SILICONES; SUBSTRATES; THIN FILMS; VAPORS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 71949090578     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la903211x     Document Type: Article

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