Thickness dependent electronic structure of ultra-thin tetrahedral amorphous carbon (ta-C) films

Thin Solid Films

Volumn 520, Issue 7, 2012, Pages 2909-2915

  Soin, Navneet ^a   Roy, Susanta Sinha ^b   Ray, Sekhar Chandra ^c   Lemoine, Patrick ^a   Rahman, Md Anisur ^a   Maguire, Paul D ^a   Mitra, Sushanta K ^b   McLaughlin, James A ^a  

^a UNIVERSITY OF ULSTER   (United Kingdom)

^b UNIVERSITY OF ALBERTA   (Canada)

^c UNIVERSITY OF THE WITWATERSRAND   (South Africa)

Author keywords

Filtered cathodic vacuum arc; Near edge X ray absorption fine structure spectroscopy; Raman spectroscopy; Tetrahedral amorphous carbon; Thin films; X ray photoelectron spectroscopy

Indexed keywords

AFM; CRITICAL THICKNESS; FILM ROUGHNESS; FILTERED CATHODIC VACUUM ARC; H-BONDS; LIMITING FACTORS; LOCAL BONDING; MATRIX STRUCTURE; MICROSTRUCTURAL PROPERTIES; NEAR EDGE X-RAY ABSORPTION FINE STRUCTURE SPECTROSCOPIES; OPTICAL STORAGE DEVICES; SPECTROSCOPIC TECHNIQUE; TA-C FILM; TETRAHEDRAL AMORPHOUS CARBON; TETRAHEDRAL AMORPHOUS CARBON (TA-C) FILMS; ULTRA-THIN;

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CARBON FILMS; ELECTRONIC STRUCTURE; LASER RECORDING; MAGNETIC STORAGE; PHOTONS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SURFACE DEFECTS; THIN FILMS; ULTRATHIN FILMS; VACUUM APPLICATIONS; VIRTUAL STORAGE; X RAY ABSORPTION; X RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON;

EID: 84856368085     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.12.039     Document Type: Article

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