Defect density and atomic bond structure of tetrahedral amorphous carbon (ta-C) films prepared by filtered vacuum arc process

Journal of Applied Physics

Volumn 95, Issue 9, 2004, Pages 4829-4832

  Lee, Churl Seung ^a,b,c   Shin, Jin Koog ^a,c   Eun, Kwang Yong ^a   Lee, Kwang Ryeol ^a   Yoon, Ki Hyun ^a,b  

^a Korea Institute of Science and Technology   (South Korea)

^b Yonsei University   (South Korea)

^c Korea Electronic Technology Institute (KETI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; CARBON; CATHODES; CHEMICAL BONDS; DEPOSITION; ELECTRIC POTENTIAL; FOURIER TRANSFORM INFRARED SPECTROSCOPY; IONIZATION; PARAMAGNETIC RESONANCE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON WAFERS; VACUUM APPLICATIONS; WEAR RESISTANCE;

DEFECT DENSITY; FILTERED VACUUM ARC PROCESS; OPTICAL TRANSPARENCY; UNPAIRED SPIN DENSITY;

AMORPHOUS FILMS;

EID: 2442683283     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1699481     Document Type: Article

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