Nucleation delay in atomic layer deposition on a thin organic layer and the role of reaction thermochemistry

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 1, 2012, Pages

  Hughes, Kevin J ^a   Engstrom, James R ^a  

^a School of Operations Research and Industrial Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION BARRIERS; ANGLE RESOLVED X RAY PHOTOELECTRON SPECTROSCOPY; ENTHALPY CHANGE; INCUBATION PERIODS; INCUBATION TIME; INORGANIC THIN FILMS; INTERNAL ENERGIES; LIGAND EXCHANGE REACTIONS; ORGANIC LAYERS; POLY(ETHYLENEIMINE); SURFACE-SENSITIVE TECHNIQUE; TA-CONTAINING; THIN ORGANIC LAYERS;

ALUMINUM; ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; ATOMIC SPECTROSCOPY; DEPOSITION; ETHYLENE; HAFNIUM OXIDES; NUCLEATION; PHOTONS; SILICON COMPOUNDS; TANTALUM; TANTALUM OXIDES; THERMOCHEMISTRY; THIN FILMS; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM GROWTH;

EID: 84855572488     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3625564     Document Type: Article

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