Initial reactions in chemical vapor deposition of Ta2O5 from TaCl5 and H2O. An Ab initio study

Journal of Physical Chemistry A

Volumn 104, Issue 6, 2000, Pages 1186-1195

  Siodmiak, Magdalena ^a   Frenking, Gernot ^a   Korkin, Anatoli ^b  

^a PHILIPPS UNIVERSITY MARBURG   (Germany)

^b MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001165242     PISSN: 10895639     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp992673d     Document Type: Article

References (2)

1. McKinley, K. A.; Sandler, N. P. Thin Solid Films 1996, 290-291, 440.
2. Rausch, N.; Burte, N. P. Microelectron. J. 1993, 421.