Development of rf plasma sputtered Al 2 O 3 -TiO 2 multilayer broad band antireflecting coatings and its correlation with plasma parameters

Applied Surface Science

Volumn 258, Issue 7, 2012, Pages 2275-2282

  Laha, P ^a   Panda, A B ^a   Mahapatra, S K ^a,c   Barhai, P K ^a   Das, A K ^b   Banerjee, I ^a  

^a BIRLA INSTITUTE OF TECHNOLOGY   (India)

^b BHABHA ATOMIC RESEARCH CENTRE   (India)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

OES; Optical properties; PL; X ray photoemission spectroscopy (XPS)

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ARGON; COATINGS; ENERGY GAP; GRAIN SIZE AND SHAPE; MULTILAYERS; OPTICAL EMISSION SPECTROSCOPY; OPTICAL PROPERTIES; OXYGEN; PLASMA DEVICES; REFLECTION; REFRACTIVE INDEX; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

ANTI-REFLECTING COATING; ELEMENTAL DISTRIBUTION; EXTINCTION COEFFICIENTS; IN-SITU INVESTIGATIONS; MULTILAYER DEPOSITIONS; REACTIVE MAGNETRON SPUTTERING; TRANSMITTANCE AND REFLECTANCES; X RAY PHOTOEMISSION SPECTROSCOPY;

PLASMA DIAGNOSTICS;

EID: 84855542717     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.09.118     Document Type: Article

References (42)

1. H.C. Barshilia, and K.S. Rajam J. Mater. Res. 19 11 2004 Nov
2. J. Boudadena, P. Oelhafena, A. Schulerb, C. Roeckerb, and J.L. Scartezzinib Sol. Energy Mater. Sol. Cells 89 2005 209 218
3. T. Fujibayashi, T. Matsui, and M. Kondo Appl. Phys. Lett. 88 2006 183508
4. M. Barrera, J. Plá, C. Bocchia, and A. Migliori Sol. Energy Mater. Sol. Cells 92 2008 1115 1122
5. H.A. Muhammad, S. Muhammad, P. Frank, and N. Shahzad Cent. Eur. J. Phys. 6 4 2008 853 863
6. O.D. Gordan, S. Hermann, M. Friedrich, and D.R.T. Zahn J. Phys. IV France 132 2006 73 76
7. A.A. Tonkikh, V.G. Talalaev, N.D. Zakharov, G.E. Cirlin, V.M. Ustinov, and P. Werner Tech. Phys. Lett. 29 2003 739 742
8. S. Zaitsu, T. Jitsuno, M. Nakatsuka, T. Yamanak, and S. Motokoshi Appl. Phys. Lett. 80 2002 1467622
9. K. Tappura, J. Aarik, and M. Pessa IEEE Photonics Technol. Lett. 8 1996 319 321
10. M.A. Omari, R.S. Sorbello, and C.R. Aita J. Appl. Phys. 99 2006 123508
11. J.H. Selj, A. Thøgersen, S.E. Foss, and E.S. Marstein J. Appl. Phys. 107 2010 074904
12. A.V. Tikhonravov Appl. Opt. 32 28 1993 5417 5426
13. M. Farooq, and M.G. Hutchins Sol. Energy Mater. Sol. Cells 71 2002 73 83
14. Pinaki Laha, A.B. Panda, S. Dahiwale, K. Date, K.R. Patil, P.K. Barhai, A.K. Das, I. Banerjee, and S.K. Mahapatra Thin Solid Films 519 2010 1530 1535
15. B. Liu, X. Zhao, Q. Zhao, C. Li, and X. He Mater. Chem. Phys. 90 March (1) 2005 207
16. G. Zambrano, H. Riascos, P. Prieto, E. Restrepo, A. Devia, and C. Rincon Surf. Coat. Technol. 172 2003 144
17. http://physics.nist.gov/cgi-bin/AtData/lines-form.
18. A. Bousquet, L. Spinelle, J. Cellier, and E. Tomasella Plasma Process. Polym. 6 2009 S605 S609
19. F. Rebib, E. Tomasella, L. Thomas, J. Cellier, T. Sauvage, and M. Jacquet Appl. Surf. Sci. 252 2006 5611 5614
20. J.M. Hendron, C.M.O. Mahony, T. Morrow, and W.G. Graham J. Appl. Phys. 81 1997 2131
21. B. Liu, X. Zhao, Q. Zhao, C. Li, and Xin He Mater. Chem. Phys. 90 2005 207 212
22. C. Merckling, M. El-Kazzi, L. Becerra, L. Largeau, G. Patriarche, G. Saint-Girons, and G. Hollinger Microelectron. Eng. 84 2007 2243 2246
23. J. Musil, J. Šícha, D. Heřman, and R. Čerstvŷ J. Vac. Sci. Technol. A 25 July-August (4) 2007
24. M. Liu, C.Y. Ma, and Q.Y. Zhang Phys. Status Solidi (a) 205 4 2008 961 964
25. W.D. Sproul, D.J. Christie, and D.C. Carter Thin Solid Films 491 2005 1 17
26. P. Madhu Kumar, S. Badrinarayanan, and M. Sasty Thin Solid Films 358 2000 122
27. J. Yu, X. Zhao, and Q. Zhao Mater. Chem. Phys. 69 March (1-3) 2001 25
28. P. Vitanov, P. Stefanov, A. Harizanova, and T. Ivanova J. Phys.: Conf. Ser. 113 2008 012036
29. C. Yong-Lak J. Mater. Sci. 39 2004 5695
30. Q. Zhao, C. Li, B. Liu, and X. Zhao J. Wuhan Univ. Technol. Mater. Sci. Ed. 18 2003 36
31. N. Martin, C. Rousselot, C. Savall, and F. Palmino Thin Solid Films 287 October (1-2) 1996 154
32. A. Ortiz, J.C. Alonso, V. Pankov, and D. Albarran J. Lumin. 81 1999 45 51
33. M. Itou, A. Fujiwara, and T. Uchino J. Phys. Chem. C 113 2009 20949 20957
34. G.J. Pogatshnik, Y. Chen, and B.D. Evans IEEE Trans. Nucl. Sci. 1987 1709 NS-34
35. Y. Liu, Y. Yuan, C. Li, X. Gao, X. Cao, and J. Li Mater. Lett. 62 2008 2907 2909
36. L. Shi, H. Shen, L. Jiang, and X. Li Mater. Lett. 61 2007 4735 4737
37. E.B. Kaganovich, I.M. Kizyak, A.A. Kudryavtsev, and E.G. Manoilov Semicond. Phys. Quantum Electron. Optoelectron. 12 2 2009 165 169
38. X.S. Peng, L.D. Zhang, G.W. Meng, X.F. Wang, Y.W. Wang, C.Z. Wang, and G.S. Wu J. Phys. Chem. B 106 2002 11163 11167
39. J. Lee, K. Park, T. Kim, H. Choi, and Y. Sung Nanotechnology 17 2006 4317 4321
40. W.S. Choi, E.J. Kim, S.G. Seong, Y.S. Kim, C. Park, and S.H. Hahn Vacuum 83 2009 878 882
41. Y.F. Hsu, A.B. Djuris, K.H. Tam, K.Y. Cheung, and W.K. Chan J. Cryst. Growth 307 2007 348
42. S.H. Jeong, J.K. Kim, B.S. Kim, S.H. Shim, and B.T. Lee Vacuum 76 2004 507 515