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Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

Optical emission spectroscopy analysis of Ar/N2 plasma in reactive magnetron sputtering

(4) Bousquet, Angélique a Spinelle, Laurent a Cellier, Joël a Tomasella, Eric a

a UNIVERSITÉ CLERMONT AUVERGNE (France)

Author keywords

Optical emission spectroscopy; Physical vapor deposition; Silicon carbide nitride

Indexed keywords

DEPOSITED FILMS; DISSOCIATION RATES; PHYSICAL ASPECTS; REACTIVE MAGNETRON SPUTTERING; TARGET SPUTTERING; TARGET SURFACE;

ARGON; DISSOCIATION; ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; LIGHT EMISSION; NITRIDES; NITROGEN PLASMA; PHOTORESISTS; PHYSICAL VAPOR DEPOSITION; SILICON CARBIDE; TARGETS;

OPTICAL EMISSION SPECTROSCOPY;

EID: 77954903706 PISSN: 16128850 EISSN: 16128869 Source Type: Journal
DOI: 10.1002/ppap.200931602 Document Type: Conference Paper

Times cited : (16)

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