The effect of O2 partial pressure on the structure and photocatalytic property of TiO2 films prepared by sputtering

Materials Chemistry and Physics

Volumn 90, Issue 1, 2005, Pages 207-212

  Liu, Baoshun ^a   Zhao, Xiujian ^a   Zhao, Qingnan ^a   Li, Chunling ^a   He, Xin ^a  

^a WUHAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Magnetron sputtering; Oxygen partial pressure; Photocatalysis; Titanium dioxide

Indexed keywords

ABSORPTION; ATOMIC FORCE MICROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PARTIAL PRESSURE; PHOTOCATALYSIS; SPUTTER DEPOSITION; SUBSTRATES; TITANIUM DIOXIDE; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

LIQUID DEPOSITION; OXYGEN PARTIAL PRESSURE; UNIFORM COATINGS; WET PROCESSES;

THIN FILMS;

EID: 10844260884     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2004.10.038     Document Type: Article

References (11)

1. 2 dispersion under visible light irradiation, Appl. Catal. B: Environ. 15 (1998) 147-156.
2. 2 thin films, Mater. Res. Bull. 35 (2000) 1293-1301.
3. 2 films prepared by liquid phase deposition, Thin Solid Films 371 (2000) 148-152.
4. 2 thin films coated on glass by DC reactive magnetron sputtering, Rare Met. Mater. Eng. 32 (5) (2003) 339-343.
5. 2 films sputtered on unheated substrate, Surf. Coat. Technol. 153 (2002) 93-99.
6. 2 r.f. sputtered thin films, Appl. Surf. Sci. 156 (2000) 200-206.
7. 2 dispersions: the influence of hydrogen peroxide and bicarbonate ion, Water Sci. Technol. 34 (1996) 73-80.
8. 2 films deposited by different techniques, Thin Solid Films 197 (1991) 279-285.
9. U. Diebold, The surface science of titanium dioxide, Surf. Sci. Rep. 48 (2003) 53-229.
10. L. Sir Ghi, T. Aoki, Y. Hatanaka, Hydrophilicity of TiO thin films obtained by radio frequency magnetron 2 sputtering deposition, Thin Solid Films 422 (2002) 55-61.
11. x:OH thin films, Surf Sci. 507-510 (2002) 778-782.