Effects of gas flow on particle growth in silane RF discharges

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 7 B, 1999, Pages 4556-4560

  Matsuoka, Yasuhiro ^a   Shiratani, Masaharu ^a   Fukuzawa, Tsuyoshi ^a   Watanabe, Yukio ^a   Kim, Kyo Seon ^b  

^a KYUSHU UNIVERSITY   (Japan)

^b Kangwon National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; GROWTH (MATERIALS); LASER BEAMS; LIGHT SCATTERING; PARTICLES (PARTICULATE MATTER); PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SHEATHS; REACTION KINETICS; SILANES;

PARTICLE GROWTH; SILANE DISCHARGE;

PLASMA FLOW;

EID: 0033157823     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.4556     Document Type: Article

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