Transition of particle growth region in SiH4 RF discharges

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 10, 1998, Pages 5757-5762

  Kawasaki, Hiroharu ^a   Sakamoto, Kazutaka ^a   Maeda, Shinichi ^a   Fukuzawa, Tsuyoshi ^a   Shiratani, Masaharu ^a   Watanabe, Yukio ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Absorption spectroscopy; Dust; Laser light scattering; Particle; Particulate; Plasma CVD; Processing plasma; RF discharge; RF plasma; SiH2; Silane

Indexed keywords

ABSORPTION SPECTROSCOPY; DIFFUSION IN GASES; DUST; ELECTRIC DISCHARGES; ELECTRODES; FREE RADICALS; LASER APPLICATIONS; LIGHT SCATTERING; PARTICLES (PARTICULATE MATTER); PLASMA SHEATHS; POLYMERIZATION; SILANES;

PARTICLE GROWTH TRANSITION;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0032179669     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.5757     Document Type: Article

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